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dc.contributor.authorBlonder, Gregen_US
dc.coverage.spatialUSen_US
dc.date.accessioned2019-07-10T17:22:11Z
dc.date.available2019-07-10T17:22:11Z
dc.date.issued1993-10-12
dc.date.submitted1992-08-26
dc.identifierhttps://patents.google.com/patent/US5252434A/en
dc.identifier.citationGreg Blonder. "Method for forming a sloped surface having a predetermined slope."U.S. Patent 5,252,434-A.
dc.identifier.govdocUS-5252434-A
dc.identifier.urihttps://hdl.handle.net/2144/36348
dc.description.abstractIn accordance with the invention, a workpiece is provided with a sloped surface of predetermined slope by the steps of: a) coating the workpiece with resist, b) exposing the resist-coated workpiece to activating radiation which varies linearly in the direction of slope, c) developing the exposed resist, and d) etching the resulting structure to form an intaglio pattern in the workpiece surface. In a preferred embodiment, the resist is positive working photoresist and the exposure is through an exposure mask comprising a sequence of triangles having their bases aligned along a line defining the higher edge of a downward sloped region and their apices extending along a line defining the lower edge. After development, the structure is reactively ion etched.en_US
dc.subjectPhotolithographic processesen_US
dc.subjectPhotomechanical processesen_US
dc.subjectPhotoresistsen_US
dc.titleMethod for forming a sloped surface having a predetermined slopeen_US
dc.typePatenten_US
dc.description.versionPublished versionen_US
pubs.elements-sourcemanual-entryen_US
pubs.notesEmbargo: Not knownen_US
pubs.organisational-groupBoston Universityen_US
pubs.organisational-groupBoston University, College of Engineeringen_US
pubs.organisational-groupBoston University, College of Engineering, Department of Mechanical Engineeringen_US
dc.identifier.mycv429642


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