Evaporation-assisted patterning beyond random assembly
MetadataShow full item record
Citation (published version)Chuanhua Duan. 2019. "Evaporation-assisted patterning beyond random assembly." National Science Review, Volume 6, Issue 6, pp. 1065 - 1066. https://doi.org/10.1093/nsr/nwz125
Evaporation of solvent and the resulting fluid motion has been recognized as a simple but robust patterning method to yield self-assembled patterns of non-volatile solutes (e.g. microspheres, nanoparticles, bacteria, polymers, proteins, DNA, graphenes, etc.) on plain surfaces [1,2]. Such evaporation-assisted patterning could occur at small scales (O(mm^2)) by depositing and drying individual drops on surfaces, or at larger scales (O(cm^2)) by continuously moving an evaporating meniscus.
Rights© The Author(s) 2019. Published by Oxford University Press on behalf of China Science Publishing & Media Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted reuse, distribution, and reproduction in any medium, provided the original work is properly cited.