Direct and scalable deposition of atomically thin low-noise MoS2 membranes on apertures
Henley, Robert Y.
Graham, Adam C.
Bell, David C.
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Citation (published version)Pradeep Waduge, Ismail Bilgin, Joseph Larkin, Robert Y Henley, Kenneth Goodfellow, Adam C Graham, David C Bell, Nick Vamivakas, Swastik Kar, Meni Wanunu. 2015. "Direct and Scalable Deposition of Atomically Thin Low-Noise MoS2 Membranes on Apertures.." ACS Nano, Volume 9, Issue 7, pp. 7352 - 7359. https://doi.org/10.1021/acsnano.5b02369
Molybdenum disulfide (MoS2) flakes can grow beyond the edge of an underlying substrate into a planar freestanding crystal. When the substrate edge is in the form of an aperture, reagent-limited nucleation followed by edge growth facilitate direct and selective growth of freestanding MoS2 membranes. We have found conditions under which MoS2 grows preferentially across micrometer-scale prefabricated solid-state apertures in silicon nitride membranes, resulting in sealed membranes that are one to a few atomic layers thick. We have investigated the structure and purity of our membranes by a combination of atomic-resolution transmission electron microscopy, elemental analysis, Raman spectroscopy, photoluminescence spectroscopy, and low-noise ion-current recordings through nanopores fabricated in such membranes. Finally, we demonstrate the utility of fabricated ultrathin nanopores in such membranes for single-stranded DNA translocation detection.
Published in final edited form as: ACS Nano. 2015 July 28; 9(7): 7352–7359. doi:10.1021/acsnano.5b02369.