High-operating-temperature direct ink writing of mesoscale eutectic architectures
Files
Accepted manuscript
Date
2017-02-17
Authors
Boley, John William
Chaudhary, Kundan
Ober, Thomas J.
Khorasaninejad, Mohammadreza
Chen, Wei Ting
Hanson, Erik
Kulkarni, Ashish
Oh, Jinwoo Kim
Kim, Jinwoo
Aagesen, Larry K.
Version
Accepted manuscript
OA Version
Citation
J.W. Boley, K. Chaudhary, T.J. Ober, M. Khorasaninejad, W.T. Chen, E. Hanson, A. Kulkarni, J. Oh, J. Kim, L.K. Aagesen, A.Y. Zhu, F. Capasso, K. Thornton, P.V. Braun, J.A. Lewis. 2017. "High-Operating-Temperature Direct Ink Writing of Mesoscale Eutectic Architectures." ADVANCED MATERIALS, Volume 29, Issue 7, pp. ? - ? (8). https://doi.org/10.1002/adma.201604778
Abstract
High-operating-temperature direct ink writing (HOT-DIW) of mesoscale architectures that are composed of eutectic silver chloride–potassium chloride. The molten ink undergoes directional solidification upon printing on a cold substrate. The lamellar spacing of the printed features can be varied between approximately 100 nm and 2 µm, enabling the manipulation of light in the visible and infrared range.
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Copyright WILEY-VCH Verlag GmbH & Co. KGaA, 69469 Weinheim, Germany, 2016.