Direct and scalable deposition of atomically thin low-noise MoS2 membranes on apertures

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Accepted manuscript
Date
2015-07-28
Authors
Waduge, Pradeep
Bilgin, Ismail
Larkin, Joseph
Henley, Robert Y.
Goodfellow, Kenneth
Graham, Adam C.
Bell, David C.
Vamivakas, Nick
Kar, Swastik
Wanunu, Meni
Version
Published version
OA Version
Citation
Pradeep Waduge, Ismail Bilgin, Joseph Larkin, Robert Y Henley, Kenneth Goodfellow, Adam C Graham, David C Bell, Nick Vamivakas, Swastik Kar, Meni Wanunu. 2015. "Direct and Scalable Deposition of Atomically Thin Low-Noise MoS2 Membranes on Apertures.." ACS Nano, Volume 9, Issue 7, pp. 7352 - 7359. https://doi.org/10.1021/acsnano.5b02369
Abstract
Molybdenum disulfide (MoS2) flakes can grow beyond the edge of an underlying substrate into a planar freestanding crystal. When the substrate edge is in the form of an aperture, reagent-limited nucleation followed by edge growth facilitate direct and selective growth of freestanding MoS2 membranes. We have found conditions under which MoS2 grows preferentially across micrometer-scale prefabricated solid-state apertures in silicon nitride membranes, resulting in sealed membranes that are one to a few atomic layers thick. We have investigated the structure and purity of our membranes by a combination of atomic-resolution transmission electron microscopy, elemental analysis, Raman spectroscopy, photoluminescence spectroscopy, and low-noise ion-current recordings through nanopores fabricated in such membranes. Finally, we demonstrate the utility of fabricated ultrathin nanopores in such membranes for single-stranded DNA translocation detection.
Description
Published in final edited form as: ACS Nano. 2015 July 28; 9(7): 7352–7359. doi:10.1021/acsnano.5b02369.
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